Extreme ultraviolet radiation in genomic sequencing and other applications

ABSTRACT

Methods, apparatus, and processes which use Extreme ultraviolet radiation (EUV) and/or soft X-ray wavelengths to read, image, edit, locate, identify, map, alter, delete, repair and sequence genes are described. An EUV scanning tool which allows high throughput genomic scanning of DNA, RNA and protein sequences is also described. A database which records characteristic absorption spectra of gene sequences is also described.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of U.S. application Ser. No.15/422,436, filed Feb. 1, 2017, which claims the benefit of U.S.Provisional Patent Application No. 62/289,897, filed Feb. 1, 2016. Eachof the foregoing applications is incorporated herein by reference in itsentirety.

BACKGROUND

Sequencing technologies such as Next Generation Sequencing (NGS) andSanger Sequencing are used to read and identify sequence genes and basepairs of a genome. Since there are approximately 3.2 billion base pairsin the human genome a high throughput sequencing machine is needed toidentify and sequence on a large scale. Next Generation Sequencingincludes techniques like sequencing by synthesis using fluorescentlabeled terminators and massive parallelization to provide accurateidentification of genetic structure and variations. Techniques likeCRISPR are used to edit gene sequences. Specific enzymes are used totarget a given sequence within a set of gene sequences and repeatedlyremove the identified sequence. This is the state of the art.

The aforementioned techniques have inherent advantages anddisadvantages. NGS sequencing requires a high level of piecewisesegmenting, massively reproducing in parallel, reassembling andreferencing the gene sequence. CRISPR requires specific target primerswhich edit at least 20 pairs around the gene sequence of interest. Sofar, none of these technologies read and edit dynamically, nor allowselection of base pairs within a given gene sequence to be read andedited.

Optical lithography systems are commonly used for fabricating, forexample integrated circuits and devices at having physical features at14 nm and smaller. The resolving power of such systems is proportionalto the exposure wavelength. Shorter wavelengths can improve resolutionin fabrication. Extreme ultraviolet lithography (EUVL) useselectromagnetic radiation at extreme ultraviolet (EUV) wavelengths(approximately 124 nanometers to 0.1 nanometers). Accordingly, photonsat these wavelengths have energies in the range of approximately 10electron volts (eV) to 12.4 keV (corresponding to 124 nm and 0.1 nm,respectively). Using EUV wavelengths for lithography has potentialadvantages of reducing feature sizes in devices to less than 10 nm ormore such as semiconductor chips as well as in other applications suchas polymer electronics, solar cells, biotech, and medical technologies.

So far none of these technologies can read and edit at the same time,nor allow random selection of base pairs within a given gene sequence tobe dynamically read and edited.

SUMMARY

In one aspect, this disclosure relates generally to the use of ExtremeUltraviolet (EUV) radiation, soft X-ray radiation in a biotechapplication to selectively locate, read, identify a gene or genesequence either inside or outside a biological cell. It further relatesto dynamically and/or randomly and/or selectively editing, deleting,altering and/or repairing a gene at a given location within a genomicsequence. Provided herein is a method to sequence selectively andnon-sequentially without the need for DNA synthesis, biomoleculetagging, fluorescent labeling, DNA replication, enzyme cleaving,parallelization, depth of coverage, alignment to a reference genome,nano pore channels, shot-gun sequencing, ion detection, or nucleotideaddition, all of which introduce complexity, inaccuracy and time insequencing.

In another aspect, this disclosure also relates to the design of a nextgeneration EUV high throughput tool or apparatus to machine read andalter gene sequences in real time. The architecture of the tool orapparatus comprises a set of one or more illuminator optics, projectionlenses or mirrors, light focusing device. EUV or soft x ray lightsource, a collector optic, sample stage. The tool may be used inscanning mode to 2D or 3D scan DNA sequences. Extreme ultravioletwavelengths may be generated artificially by devices such as plasma andsynchrotron light sources or solid targets, or a liquid droplet source.In one embodiment, provided are six or more high numerical apertureprojection mirrors, four or more illuminator mirrors, one collector anda sample stage. The mirrors may be parabolic, aspherical or freeform. Incertain embodiments, at least 6 projection mirrors are useful to achievesufficient spatial resolution for single digit resolution nucleobasesequencing. A higher power light source is also desirable to increasethe scanning throughput or number of base pairs sequenced per hour.

A light system or apparatus such as an EUV lithography tool can be usedto focus light to sub 20 nm spot sizes. Extreme ultraviolet lithography(EUVL) uses electromagnetic radiation at extreme ultraviolet (EUV)wavelengths (approximately 124 nanometers to 0.1 nanometers).Accordingly, photons at these wavelengths have energies in the range ofapproximately 10 electron volts (eV) to 12.4 keV (corresponding to 124nm and 0.1 nm, respectively). Extreme ultraviolet wavelengths may begenerated artificially by devices such as plasma and synchrotron lightsources or solid targets. When this light is incident on a gene sequencea proportion of the light will be absorbed. Each base or base pair ofthe gene sequence will generate a characteristic absorption spectrum ata discrete EUV frequency. If such a spectrum is detected or decomposedfrom a cumulative absorption spectra set, then this can help identifythe specific base pair. The smaller the wavelength used the smaller thefocused spot size, and the higher the imaging resolution. For awavelength of light of 2.8 nm and a Numerical Aperture (NA) of 0.5 thespot size will be 2.8 nm approximately. For example a single nucleobasehas a length of 0.34 nm. This means that the imaging resolution is 9bases (˜2.8/0.34). With projection mirrors the limit of resolution canbe decreased further. This is governed by the formula k1*wavelength/NA,where k1 is a constant factor which determines the resolution limit thatcan be achieved by the lithography tool. Assuming a k1 factor ofapproximately 0.25, the limiting resolution (k1*wavelength/NA) is 1.4 nmor 4-5 bases. Using a magnification factor of 4× or 8× the resolutionlimit may be smaller, up to 1-2 base pairs. Since the spectra hasresonance peaks at discrete frequencies, it is possible to decomposefurther, use base pairing information and differences between absorptionspectra from two overlapping adjacent sets, cumulative absorption atmeasured at three spectral peaks to get more resolution sequencing. Geneidentification should be possible from the measurement of the cumulativespectra and phase information. It is expected that light of wavelength13.5 nm and smaller, specifically 2-4 nm range, (including 4.3 nm and2.8 nm) will be suitable for these applications. Absorption spectra mayequally be exchanged for transmission spectra or reflection spectra inthis disclosure. Detectors can measure a sensitivity difference inabsorption signal as small as 1×10⁻⁴. This makes it possible todistinguish cumulative differences of one nucleobase.

In an embodiment the process of reading, scanning or imaging a genesequence or nucleobase includes the process of measuring its uniqueabsorption spectra and identifying the gene from a known or simulatedspectrum.

In another aspect of this disclosure, a gene sequence or set ofnucleobases may also be edited, altered, repaired or deleted at a givenlocation or address. The deletion occurs by focusing the light spot onthe desired sequence at a given location and increasing the intensity ofthe light or the power delivered to the focused spot to sever the linkbetween two base pairs through photo-absorption, or sever the base, andpreventing regeneration. In certain embodiments the action of editing ordeleting a subset of a sequence may occur consecutively to reading thesequence. Depending on the spot size and intensity of the light one ormore gene sets can be deleted at any given location. More than onefocused spot may also be used to achieve multiple simultaneoussolutions.

In a typical embodiment gene sequences include sub elements like DNA andRNA nucleobase pairs, Cytosine, Guanine, Adenine, Thymine, Uracil. Genesequences in this disclosure also include biomaterials like DNA and RNAstrands, reads, single nucleotide polymorphisms (SNPs), bases, proteins,primers, amino acid sequences, oligonucleotides, peptides, copy numbervariants, mutations, variants, enzymes, exomes, molecules, nucleotides,alleles, chromosomes, telomeres, without limitation to the species. Eachof the five possible bases, Guanine, Cytosine. Adenine, Thymine andUracil, has a different chemical structure which is a combination ofCarbon, Hydrogen, Oxygen and Nitrogen with different relative ratios ofeach element. Since EUV/Soft-Xray absorption is sensitive to presence oftheses elements, each base will have a distinct and unique signatureabsorption spectrum at EUV wavelengths. In examples were the absorptionspectra of one or more bases are obtained at once, the absorptionspectra can be decomposed into the individual base spectrums asdescribed above. A database or library of identifiable gene sequences,nucleobases, proteins, RNA and DNA containing their respectiveabsorption spectra signatures is generated.

This disclosure improves over the existing state of the art nextgeneration sequencing (NGS) technologies because it allows forsimultaneous or dynamic reading, or imaging, mapping, and editing ordeleting of gene sequences in a given genome on a per individual basis.Current gene sequencing technologies such as whole genome shotgunsequencing, de novo sequencing or Sanger sequencing only allow forsequencing genes, after destruction, replication and referencing to thestandard reference genome. In this disclosure, a genomic map which canalso be described as a gene ontology network or a gene sequence map isgenerated. The entire sequence is recorded sequentially at least onetime by measuring the absorption and phase spectrum of each nucleobase,or each gene at each possible location. The physical coordinates of eachnucleobase, or set of nucleobases, are registered as an address,together with other global and local identifiers and landmarks. Eachgene, its absorption spectrum and gene position are recorded in thisway. Subsequently, should a specific gene sequence once identified needto be selectively or dynamically targeted, relocated or deleted, it canbe done by using the respective registration address to reposition thefocus of the light source spot for delivering intense radiation. EUVradiation has sufficient spatial and spectral resolution to physicallyand spectrally discriminate different gene sequences and spatial controlfor selectively targeting specific gene sequences. In NGS technologiesthere is no possibility of dynamically returning to a specific locationin the sequence or editing the sequence in real time while being read.

This disclosure improves over the existing state of art editingtechnologies such as CRISPR interference technique (clusteredregularly-interspaced short palindromic repeats), which rely on specificenzyme sequences to cleave the sequence or cut the genome at a specifictarget location which matches the enzyme sequence. The limitations ofCRISPR are that only one type of target sequence can be deleted at anyone time, and all instances of that target sequence in all locations, ifrepeated in the genome, are cut. Additionally, the sequence tries torepair itself after being cut repeatedly. Not only is the sequence cut,but a region of up to 20 base pairs around the target location is alsocut. In EUV radiation sequencing and deletion multiple random targetswith differently specified sequences can be edited in a single instance.Similarly, single instances of a specific target can also be edited,with a spatial resolution of up to 1-2 base pairs.

In addition to sequencing this disclosure also describes the use of EUVradiation and soft Xray, methods and apparatus described herein, in theapplication of genotyping, i.e. the process of determining which geneticvariants an individual possesses. In an embodiment EUV radiation can beused to sequence a segment of a sequence such as an exome rather thanthe entire genome and examine variants in SNPs and regions ofcommonality. The process can also be used to examine germline or somaticmutations, epigenetic variations, cancer and inheritance variations. EUVradiation sequencing can also be used for expression profiling.

The methods and apparatus described herein include the application to avariety of species including, humans, bacteria, animals, plants, yeast,mammalian cells.

A DNA, RNA or other strand may be extracted from and cell, linearized,planarized and aligned prior to sequencing in most instances. With EUVradiation sequencing a DNA segment may be additionally sequencedintracellularly and three dimensionally (3D—one or more dimensions), andnonlinearly. Typically chromatin binds the DNA strands together makingintracellular sequencing challenging. With absorption sequencing asdescribed in this disclosure, chromatin would have a differentabsorption spectrum to the discrete DNA spectrum with three spectralpeaks and therefore could be distinguished from the DNA sequence.

When imaging a sequence intracellularly the cell may be opticallytrapped with two or more lasers beams use to hold the cell in positionwhile the sequencing occurs. Another laser may also be used to cut aninsertion path in the cell membrane or cell wall or through cytoplasm toreduce the absorption of EUV by other components in the cell. Othercomponents in the cell may also be distinguished by a different spectralabsorption curves.

The sequencing of genomes requires a significant amount of data analysisand bioinformatic post-processing of data. It is beneficial to use selflearning and predictive algorithms (and other known information aboutthe location of landmark genes) to decompose groups of absorptionspectra to save on computational, measuring and reading time.Furthermore for larger spot sizes larger groups of nucleobases can besequenced with less sampling resolution, and identified from knownspectra such as those in a reference database or library, or previouslymeasured samples rather than individual measurements.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure may be more fully appreciated in connection withthe following detailed description taken in conjunction with theaccompanying drawings, wherein:

FIG. 1 illustrates calculated absorption spectra for DNA nucleobasesC,G,A,T at EUV wavelengths calculated according to the Examples herein.

FIG. 2 illustrates a DNA Scanner system with plasma lightsource andprojection mirror system for gene sequencing.

FIG. 3 illustrates a method of detecting either reflected or absorbedradiation from a macromolecule. Light illumination as close as possibleto grazing incidence is preferred due to the increased absorption.

FIG. 4 illustrates transmission spectra from G, C, A, T at non normalincidence of a single nucleobase.

DETAILED DESCRIPTION OF THE INVENTION

Provided herein are apparatuses and methods useful for locating,reading, identifying, and/or editing macromolecules.

a. Definitions

When referring to the apparatuses and methods provided herein, thefollowing terms have the following meanings unless indicated otherwise.Unless defined otherwise, all technical and scientific terms used hereinhave the same meaning as is commonly understood by one of ordinary skillin the art. In the event that there is a plurality of definitions for aterm herein, those in this section prevail unless stated otherwise.

The term “extreme ultraviolet” or “EUV” refers to electromagneticradiation in the part of the electromagnetic spectrum spanningwavelengths from 124 nm down to 10 nm. The radiation has photons withenergies from 10 eV up to 124 eV.

The term “soft X-ray” refers to electromagnetic radiation in the part ofthe electromagnetic spectrum spanning wavelengths from 10 nm down to 0.1nm. The radiation has photons with energies from 0.1 eV up to 10 eV.Extreme Ultraviolet, EUV and soft X-ray are used interchangeably in thisdisclosure to represent the full range from 0.1 nm to 124 nm.

The term “macromolecule” refers to a high molecular weight moleculehaving at least 1000 Da. Useful macromolecules include polymers ofrepeating monomers. Examples include polynucleotides, DNA, RNA,polypeptides, proteins, peptides, viruses, and oligosaccharides.

The term “spot size” refers to the diameter of a radiation beam that iscapable of interacting with a target. In embodiments where the radiationbeam contacts a support, the spot size is the diameter of the radiationbeam or beam waist that intersects the support. The spot may be afocused or collimated radiation beam by a lens or mirror system, to aminimum spot size defined by the Airy disc, and dependent on thewavelength of the radiation beam. In fact the radius of the minimum spotsize is defined by 1.22λf, where f is the f number of the lens, thefirst dark circle in the Airy pattern. In lithography systems a givenresolution is achieved by the overall magnification from a set ofprojection mirrors and the Numerical Aperture (NA) of the system.Resolution, or the minimum spot size is defined as k1λ/NA where k1 isthe resolution factor and k1 is approximately 0.25. Lithography systemstoday have already achieved a 4× magnification and 0.5 NA. For a 2.8 nmwavelength, this is a resolution of 0.7 nm or 2 base pairs. Highermagnification can be achieved by increasing the number of projectionmirrors to focus to a smaller spot size sand larger system numericalapertures. For a 8× magnification single base pair resolution will bepossible.

a. Apparatuses

Provided herein are apparatuses useful for locating, reading,identifying, and/or editing macromolecules. The apparatuses generallycomprise a radiation source, one or more macromolecules configured toabsorb at least a portion of the radiation, and a detector capable ofdetecting transmitted and/or absorbed radiation.

In certain embodiments, the radiation source is capable of transmittingradiation having a wavelength from 0.1 nm to 250 nm. In certainembodiments, the radiation source is capable of transmitting extremeultraviolet radiation and/or soft X-ray radiation. In certainembodiments, the radiation source is capable of transmitting extremeultraviolet radiation. In certain embodiments, the radiation source iscapable of transmitting soft X-ray radiation. In certain embodiments,the radiation source is capable of transmitting radiation having awavelength from 0.1 nm to 10 nm. In certain embodiments, the radiationsource is capable of transmitting radiation having a wavelength from 1nm to 10 nm. In certain embodiments, the radiation source is capable oftransmitting radiation having a wavelength from 1 nm to 250 nm. Incertain embodiments, the radiation source is capable of transmittingradiation having a wavelength from 10 nm to 250 nm. In certainembodiments, the radiation source is capable of transmitting radiationhaving a wavelength from 10 nm to 200 nm. In certain embodiments, theradiation source is capable of transmitting radiation having awavelength from 10 nm to 150 nm. In certain embodiments, the radiationsource is capable of transmitting radiation having a wavelength from 10nm to 124 nm. In certain embodiments, the radiation source is capable oftransmitting radiation having a wavelength from 0.1 nm to 124 nm.

The radiation source can be any radiation source deemed useful by thepractitioner of skill. Useful radiation sources are commerciallyavailable. Useful examples include plasma and synchrotron light sourcesor solid targets. EUV light sources include high order harmonic x-raygeneration sources, EUV beamline synchrotrons, EUV solid targets, andplasma based sources. E.g. nickel like tin produces EUV radiation at11.9 nm and nickel like silver produces EUV radiation at 13.9 nm and tindroplets produce EUV radiation at 13.5 nm. Light sources may be laserdriven e.g. laser produced plasma or electrically driven, e.g,electrically discharged plasma and be continuous or pulsed.Electrodeless Z-Pinch sources may also be used e.g. Energetiq EQ-10SXRin which has a wavelength range in the 2-4 nm and delivers 400 mW ofpower at 2.8 nm using nitrogen. Liquid jet, tin, or xenon plasmas arealso used. For example a tin plasma source has a EUV range from 8 to 19nm and a xenon plasma source has an EUV spectrum range from 8 to 19 nmwith a higher intensity range from 11 to 15 nm. In solid targetselectrons are used to bombard a given target and generate x rays.

The radiation source can be configured to transmit the desired radiationwavelengths using techniques known to those of skill in the art. Themain way of tuning the radiation source involves mirror systems such asMolybdenum Silicon (Mo/Si) multilayers which select an in band ofradiation from e.g. from 13-14 nm, by reflecting only those frequenciesand absorbing other frequencies. Similarly Carbon Titanium multilayersmay be used at 2.8 nm to select a band of radiation.

In the apparatuses, the radiation source is configured to transmitradiation that contacts one or more macromolecules. The macromoleculesare configured to absorb at least a portion of the radiation. Those ofskill will recognize that the macromolecules can also transmit a portionof the radiation.

In order to contact the macromolecule with the radiation, the apparatuscan further comprise one or more focusing components capable of focusingthe radiation to contact the macromolecule. The focusing components canbe any component capable of focusing the radiation transmitted from thesource. In certain embodiments, the focusing components are one or moremirrors. In certain embodiments, the focusing components are one or morelenses. In certain embodiments, the focusing components are one or morereflectors. In certain embodiments, the focusing components are acombination of one or more mirrors, lenses, and/or reflectors. Exemplaryconfigurations for focusing components are provided in the Examples andFIG. 2 . In certain embodiments, an apparatus comprises at least sixhigh numerical aperture projection mirrors and at least four illuminatormirrors. The mirrors may be parabolic, aspherical or freeform. Incertain embodiments, the at least 6 projection mirrors providesufficient spatial resolution for single digit resolution nucleobasesequencing. For higher resolution more mirrors may be used, or highernumerical aperture systems which focus to a smaller spot size. 6projection mirrors can achieve 4× magnification. Between 8-12 mirrorsmay be necessary for 8× magnification or single base pair resolution.

Mirrors also known as reflectors may contain multilayer coatings.Examples of multilayers in the Soft X ray region include Ti/Ni, Ca/Co,Sc/Ni, Mg/Ni, Be/Ni, B4C/Ru. C/Fe and Sc/Wc, Ba/Co, Ca/Co, C/Co. Mirrorsmay also be nanoscale combinations of a single base material e.g Ni orCo or Mo and may contain other nanoscale combinations of materials intwo or three dimensions. Physical sizes of mirrors range from small 1-10cm diameter up to 1 m diameter or larger depending one the size of thetool and the capture area. Mirrors consist of a substrate plus a coatingand the substrate may be Silicon, Silica or Be.

In certain embodiments, the radiation spot size is 0.1-100 nm. Incertain embodiments, the radiation spot size is 1-100 nm. In certainembodiments, the radiation spot size is 10-75 nm. In certainembodiments, the radiation spot size is 10-50 nm. In certainembodiments, the radiation spot size is 10-25 nm. In certainembodiments, the radiation spot size is 10-230 nm.

The apparatuses further comprise one or more macromolecules configuredto absorb at least a portion of the radiation. Useful macromolecules aredescribed in detail below. Each macromolecule can be configured toabsorb the radiation using standard techniques and components. Themacromolecule can be presented in the radiation in solution, or on asolid support, or in any other form deemed suitable to the person ofskill. The macromolecule in solution can be presented in a cuvette, in amicrotiter well, microfluidic device or channel, on a slide, or in or onany other suitable medium.

In certain embodiments, the macromolecule is provided on a solidsupport. The solid support can be any material suitable for supporting amacromolecule. Useful support materials include glass, ceramic, silica,polycarbonate, PDMS and silicon. Depending on whether the system is usedin reflective or transmission mode, either a membrane support fortransmission or a super polished or flat substrate can be used to holdthe macromolecule Examples of useful solid supports include microscopeor slides, silicon wafers, graphene films, imaging or registrationgrids. Membranes support include silicon nitride, silicon dioxide,porous films, carbon grids or holey grids. The supports can be obtainedfrom commercial suppliers or manufactured according to standardtechniques.

The supports can comprise any number of macromolecules. In certainembodiments, each support provides a single macromolecule.Advantageously, certain apparatuses and methods provided hereinfacilitate sequencing of a single macromolecule. In further embodiments,each support provides a plurality of macromolecules. The apparatuses andmethods provided herein also facilitate sequencing of a number ofmacromolecules. In certain embodiments, a plurality of macromoleculescan be sequenced in parallel. In certain embodiments, a plurality ofmacromolecules can be sequenced simultaneously.

When the support provides a plurality of macromolecules, the density ofmacromolecules can be any density suitable for the methods describedherein. The approach seeks to identify single units of macromolecules.

In certain embodiments, the support is provided on a stage that iscapable of moving the one or more macromolecules. For instance, thestage can be capable of translating the macromolecule in any directionrelative to the radiation. In certain embodiments, the stage is capableof moving the macromolecule so that a first monomer of the macromoleculecontacts the radiation. The first monomer can be any monomer in themacromolecule—a terminal monomer or an internal monomer. In certainembodiments, the stage is capable of moving the macromolecule so that asecond monomer of the macromolecule contacts the radiation. In certainembodiments, the second monomer is adjacent to the first. In certainembodiments, the stage is capable of moving the macromolecule indiscreet distances of one monomer per movement. In such embodiments, thestage is capable of moving the macromolecule through the radiation onemonomer at a time. For instance, in a first position, monomers n throughm of the macromolecule might contact the radiation. After movement to asecond position, monomers n+1 through m+1 would contact the radiation.The distance m−n would vary and depend on the spot size of the radiationbeam incident on the macromolecule.

Useful stages for the above component are known to those of skill in theart. Examples include nanopositioners, piezo stages, nanopositioningstages, encoders. These stages have translational and rotationalcapability, in 3 dimensions, with a resolution of 0.1 nm. Since one basehas an approximate distance of 0.34 nm this is sufficient to resolve ortranslate across a single base.

Detection of a macromolecule constituent can be done in reflective ortransmissive mode. If in reflectance mode the reflectivity spectra isrecorded from the plane of the incidence angle and spectral peaks atspecific wavelengths indicate the absorption. If in transmissive modethen spectral dips in the absorption spectra identify the absorptionsignature. This is shown in FIG. 3 .

Macromolecules

The macromolecule can be any macromolecule deemed suitable by those ofskill in the art. In certain embodiments, the macromolecule is apolymer. In certain embodiments, the macromolecule is a polypeptide. Incertain embodiments, the macromolecule is a peptide or protein. Incertain embodiments, the macromolecule is a polynucleotide. In certainembodiments, the macromolecule is DNA. In certain embodiments, themacromolecule is RNA. In certain embodiments, the macromolecule is anoligosaccharide.

The macromolecule can be prepared by any method deemed suitable by thoseof skill. The macromolecule can also be obtained from any source deemedsuitable by those of skill. In certain embodiments, the macromolecule issynthetic. In certain embodiments, the macromolecule is of cellularorigin. In certain embodiments, the macromolecule is isolated from acell. In certain embodiments, the macromolecule is within a cell.

Generally, the macromolecule is presented on a support, as discussedabove. The macromolecule can be resting on the support. In certainembodiments, the macromolecule is immobilized on the support. Themacromolecule can be immobilized on the support by any technique deemedsuitable. In certain embodiments, the macromolecule is linked to thesupport via a non-covalent interaction. Examples of non-covalentinteractions include electrostatic interactions and hydrophobicinteractions. In certain embodiments, the macromolecule is linked to thesupport via one or more covalent bonds. In certain embodiments, thesupport is derivatized for linking to a macromolecule. A glass supportcan be derivatized, for example, by silanization with amino or epoxideor mercapto groups. Macromolecules linked to aminio, succinyl, or sulfurgroups can be immobilized covalently on such derivatized by standardtechniques. In certain embodiments, the support is derivatized withbiotin and the macromolecule is linked to avidin via standardtechniques. In certain embodiments, the support is derivatized withavidin and the macromolecule is linked to biotin via standardtechniques. In such embodiments, the immobilization linkage is formed bythe interaction of avidin and biotin.

The supported macromolecule is thus configured for contact with theradiation. In certain embodiments, the support is moved to position themacromolecule, or a portion thereof, in the radiation. The radiationsource, the optional optics, and the support are configured so that theradiation contacts the macromolecule. The detector is configured todetect radiation absorbed and/or transmitted and/or re-emitted by themacromolecule.

Methods

In the methods provided herein, a radiation source generates radiation.The radiation contacts a macromolecule which absorbs at least a portionof the radiation. Radiation absorbed and/or transmitted by themacromolecule is detected by a detector.

In polynucleotide sequencing methods, each base or base pair of apolynucleotide provides a characteristic absorption spectrum at discreteEUV frequencies. Exemplary absorption spectra are provided in theFigures and Examples herein. If a single base or base pair isresponsible for the absorption, that base pair can be identified fromthe absorption spectrum. If a plurality of bases or base pairs isresponsible for the absorption, decomposition of the absorption spectrumcan identify the contributing bases or base pairs. In certainembodiments, the stage is moved through the radiation spot size. Changesin the composite absorption spectrum at different wavelengths indicatewhich bases or base pairs moved out of the radiation spot and whichbases or base pairs moved into the radiation spot. From these changes,the methods can identify the bases or base pairs that moved out of theradiation spot and the bases or base pairs that moved into the radiationspot. These identified bases or base pairs provide sequence informationfor the macromolecule. Accordingly, provided herein are methods foridentifying the sequence of a macromolecule.

In certain embodiments, the methods provided herein are applied to anumber of polynucleotides. The absorption spectra of thesepolynucleotides are stored along with the base or base pair sequence ofthe polynucleotide. In these methods, a library of spectra andcorresponding sequences is developed. This library facilitates theidentification of the sequences of new polynucleotides. In certainembodiments, provided herein are methods of machine-based learning ofthe spectra and their corresponding sequences. As the components of thepresent apparatuses accumulate more and more spectra and sequences, theybecome more proficient at identifying sequences from new spectra.

In this embodiment the process of reading, scanning or imaging a genesequence or nucleobase includes the process of measuring its uniqueabsorption spectra and/or identifying the gene from a known or simulatedspectrum.

In another aspect of this disclosure, a gene sequence or set ofnucleobases may also be edited, altered, repaired or deleted at a givenlocation or address. The deletion occurs by focusing the light spot onthe desired sequence at a given location and increasing the intensity ofthe light or the power delivered to the focused spot to sever the linkbetween two base pairs through photo-absorption, or sever the base, andpreventing regeneration. In certain embodiments the action of editing ordeleting a subset of a sequence may occur consecutively to reading thesequence. Depending on the spot size and intensity of the light one ormore gene sets can be deleted at any given location. More than onefocused spot may also be used to achieve multiple simultaneoussolutions.

In certain embodiments, provided herein are methods for cutting amacromolecule. In any of the configurations above, the intensity of theradiation on a macromolecule can be increased to a high intensity,sufficient to cut one or more bonds of the macromolecule. In certainembodiments, a particular sequence of the macromolecule is identified,as described above. When the sequence is identified in the apparatus,the intensity of the radiation is tuned to cut the macromolecule. Suchembodiments provide sequence-specific cutting of a target sequence in amacromolecule. In these embodiments, the macromolecule can be a peptideor protein, and the macromolecule can be a polynucleotide such as DNA orRNA.

In certain embodiments a 3D map or network of the gene ontology ormacromolecule may be formed. This includes a registration database ofthe physical and sequence location of each gene. After mapping eachsequence the location of a given sequence can be dynamically addressed,and edited or repaired at a specific location.

EXAMPLES Example 1

In a molecular spectral evaluation, each nucleobase is contacted withEUV radiation at wavelengths from 0 nm to 5.0 nm. Absorption spectra foreach nucleobase is calculated and provided in FIG. 1 and transmissionspectra FIG. 4 . C, G, A and T have unique spectra due to their uniquemolecular combinations and densities. In some cases the spectralsignature consists of 3 spectral dips in FIG. 4 (Guanine) at wavelengthsof 2.2 nm (oxygen), 2.8 nm (nitrogen) and 4.3 nm (carbon and hydrogen)and some cases such it consists of 2 spectral dips (Adenine) at 2.8 nmand 4.3 nm wavelength. Furthermore the relative spectral intensity ofeach of the spectral dips is proportional to the number of oxygen (at2.3 nm wavelength) atoms, nitrogen atoms (at 2.8 nm wavelength) andcarbon atoms (at 4.3 nm wavelength) present in each nucleobase of themacromolecule. H atoms are relatively transparent. In this way organicmolecules, peptides, amino acids can be identified and correlated withtheir known structure. Additionally, information about known pairingstructure, and spatial information to help further identify theconstituent of the macromolecule.

Example 2

In some cases the macromolecule has an identifier atom, e.g. a Chlorineatom. In this case an additional spectral dip is observed at anotherwavelength e.g at 6.5 nm Since plasma sources for EUV and Soft x ray arebroad in their spectral range some macromolecule constituents withunique atoms can easily be identified.

All publications and patent, applications cited in this specificationare herein incorporated by reference as if each individual publicationor patent application were specifically and individually indicated to beincorporated by reference. While the claimed subject matter has beendescribed in terms of various embodiments, the skilled artisan willappreciate that various modifications, substitutions, omissions, andchanges may be made without departing from the spirit thereof.Accordingly, it is intended that the scope of the subject matter limitedsolely by the scope of the following claims, including equivalentsthereof.

What is claimed:
 1. A sequence editing mechanism where EUV or soft X-rayradiation focused in a spot size less than 230 nm is delivered to atarget sequence to sever the base in the sequence.
 2. The sequenceediting mechanism of claim 1 where multiple, unique target sequences areedited.